"SiO2 single layer for reduction of the standing wave effects in ..."

Edson J. Carvalho et al. (2006)

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DOI: 10.1016/J.MEJO.2006.07.027

access: closed

type: Journal Article

metadata version: 2020-02-22

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Edson J. Carvalho, Marco Antonio Robert Alves, Edmundo S. Braga, Lucila Cescato:
SiO₂ single layer for reduction of the standing wave effects in the interference lithography of deep photoresist structures on Si. Microelectron. J. 37(11): 1265-1270 (2006)

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