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- Peter Trefonas (born 1958) is a retired DuPont Fellow (a senior scientist) at DuPont, where he had worked on the development of electronic materials. He is known for innovations in the chemistry of photolithography, particularly the development of anti-reflective coatings and polymer photoresists that are used to create circuitry for computer chips. This work has supported the patterning of smaller features during the lithographic process, increasing miniaturization and microprocessor speed. (en)
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- 17569 (xsd:nonNegativeInteger)
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- ACS Heroes of Chemistry (2014), Perkin Medal (2016) (en)
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- "Peter Trefonas: Chemistry is key player in lithography process", Micro/Nano Lithography, SPIE (en)
- "Dow Chemical - Dow AR Fast Etch Organic Bottom Antireflectant Coatings", ACS (en)
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- Peter Trefonas (born 1958) is a retired DuPont Fellow (a senior scientist) at DuPont, where he had worked on the development of electronic materials. He is known for innovations in the chemistry of photolithography, particularly the development of anti-reflective coatings and polymer photoresists that are used to create circuitry for computer chips. This work has supported the patterning of smaller features during the lithographic process, increasing miniaturization and microprocessor speed. (en)
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