US4715935 (1)

United States Patent [19]
Lovie et a1.
[54] PALLADIUM AND PALLADIUM ALLOY
PLATING -
[75] Inventors: John R. Lovie, New Providence,
N.J.; Gerardus A. Somers, Schayk;
Jan J. M. Hendriks, Sint Oedenrode,
both of Netherlands
OMI International Corporation,
Warren, Mich.
[21] Appl. No.: 819,968
[22] Filed: Jan. 21, 1986
[30] Foreign Application Priority Data
Jan. 25, 1985 [GB] United Kingdom ................. 8501856
[51] 1111.014 .......................... c251) 3/52; c251) 3/56
[52] US. 01. ...................................... 204/44.6; 204/447
[58] Field of Search ........................ 204/47,44.6, 109;
106/124, 1.28
[73] Assignee:
[56] References Cited
U.S. PATENT DOCUMENTS
2,469,727 5/1949 Hoffman ............................... 204/49
3,530,050 9/1970 Hill et a1. .......... 204/47
4,430,172 2/1984 Brugger et al. . 204/44.6
4,487,665 12/1984 Miscioscio 204/47
4,545,869 10/1985 Goldman .............................. 204/47
4,715,935
Dec. 29, 1987
[11] Patent Number:
[45] Date of Patent:
FOREIGN PATENT DOCUMENTS
2133041 7/1984 United Kingdom .................. 204/47
OTHER PUBLICATIONS
F. R. Hartley, “The Chemistry of Platinum and Palla
dium”, p. 186, (1973).
Frederick G. Mann et al., J. Chem. Soc., pp. 1642-1652,
(1935).
Primary Examiner-—G. L. Kaplan
Attorney, Agent, or Firm-Richard P. Mueller
[57] ABSTRACI‘
The dif?culties associated with electroplating palla
dium metal or alloy deposits from palladium diammino
dichloride, palladium diamino dinitrite and palladium
triammino sulphite baths can be avoided by plating
from palladium baths containing oxalate. The palladium
and oxalate may be in a single complex, such as palla
dium diamino oxalate, (Pd(NH3)2C2O4), palladium tet
raamino oxalate (Pd(NH3)4C2O4) or an ammonium or
alkali metal salt of palladium dioxalate (M2Pd(C2O4))2),
where M represents an ammonium or alkali metal cat
ion.
Alloying metal ions may also be present, as may an
electrolyte, a brightener and/or a stress reducer.
15 Claims, No Drawings

4,715,935
1
PALLADIUM AND PALLADIUM ALLOY
PLATING
This invention relates to a composition and a method
for the plating of palladium in its pure metal form and
alloyed with other metals.
The noble metal palladium has been plated on to a
variety of substrates for several years for such func
tional uses as increasing conductivity at electrical
switch contact elements and such decorative uses as
providing a bright white deposit rivalling rhodium in
quality. Palladium deposits have also been noted for
their ability to withstand post-plating forming opera
tions and maintain low contact resistance; further, they
wear well and have good solderability properties.
Previously palladium has commonly been plated
from compositions containing palladium diammine di
chloride as disclosed in, for example, U.S. application
No. 4098656. Compositions such as these, however,
suffer from the disadvantage of undesirable anode reac
tions, which include the evolution of chlorine gas, hy
pochlorite and other oxidising species which can lead to
the breakdown of organic addition agents (usually
brighteners and stress reducers) which may be present
and the passivation of substrates such as nickel on
which the palladium metal or alloy may be desired to be
deposited. The reactions that occur in such a system are
as follows:
cathode
[Pd(NH3)412+ + ze- %Pd + 4NH3
anode
2c1- -%c12 + 2e
but:
BC]; + 2NH3 + 60H‘ —>N1 + 6Cl‘ 61-120
and:
NH3 + n20 ——>NH4+ + on
so total is:
It should be noticed that this scheme does not set out
the intermediate reactions involving OCl-, NHzCl and
Pd(IV) species.
Another known palladium plating composition in
volves the use of palladium diammino dinitrite, as
taught in, for example, U.S. application No. 4401527.
Other disadvantages are associated with such composi
tions. These include the reaction of nitrite ion with
ammonium ion to produce nitrogen gas and water. Con
trol of nitrite ion concentration is therefore a problem.
Further, although this is not such a signi?cant disadvan
tage, a build up of both nitrate ion and ammonium ion
occurs as the nitrite ions tend to be oxidised at the cath
ode. The reactions that occur in the palladium diam
mino dinitrite system are as follows:
5
10
20
25
30
35
45
50
55
60
65
2
-continued
thod :
N02‘ + zone-arm + N03- + 2r
i lution:
n so NH3 + H2O —>NH4+ + on
and:
NH4''' + N0;- %N2 + 21120
so total is:
[Pdmmnmovn —>
Pd + [-120 + N2 + NH4+ + N03
Palladium sulphite compositions have also been pre
viously disclosed (see, for example U.S. application No.
3933602) although not so commonly used in the art. The
reactions that occur in the sulphite system are as fol
lows:
ll’d?tl?ml2+ + 5032“
th d :
ca 0 e [Pd(NH3)4]2+ + 2F -%Pd + 4NH3
anode:
$032- + 20H" —->so41- + H1O + 2r
1 t' :
so u ‘on NH; + H20 %NH4+ + on
so total is:
[Pd(NH3)3SO3] + H2O %
Pd + NH3 + 2NH4+ + so42—
Disadvantages associated with sulphite baths include
the difficulty of using a concentration ofsulphite which
is neither low nor high, as at these intermediate concen
trations the palladium triammino sulphite complex
tends to precipitate out of solution with an appropriate
cation. This problem can theoretically be avoided by
working at low sulphite concentrations, in which solu
bility is not a problem, or at high sulphite concentra
tions, in which the soluble palladium diammino disulph
ite complex ion is formed. But low sulphite concentra
tions are difficult to control as sulphite ions are broken
down at the anode, and high sulphite concentrations
can lead to an unacceptable amount of sulphur in the
plated deposit: this results in poor corrosion resistance.
Also, a build up of sulphate ions occurs.
In view of these difficulties with palladium diammino
dinitrite and palladium triammino sulphite composi
tions, palladium diammino dichloride baths have re
mained the most widely used in the art.
It has now been found that it is possible to plate palla
dium from a composition whose anode reactions pres
ent less of a problem than palladium diammino dichlo
ride compositions.
It has been discovered that if oxalic acid or oxalate
ions (the two terms are used interchangeably in this
speci?cation unless the context requires otherwise) are
present and are the most readily oxidisable species pres
ent, they will be oxidised at an insoluble anode with the
evolution of carbon dioxide, carbonate ions or bicar
bonate ions. This oxidation may be found to proceed

4,715,935
3
with an electrochemical efficiency of virtually 100%,
thus-effectively preventing the occurrence of other
undesirable anode reactions.
According to a ?rst aspect of the present invention,
there is provided a palladium metal or palladium alloy
plating composition comprising a source of palladium
metal and a source of oxalate ions, and optionally a
source of alloying metal ions. The concentration of
palladium in the composition may broadly range from 1
g/l to 60 g/l or the limit of solubility, with a range of
from 5 g/l to 30 g/l being preferred and a concentration
of about 10 g/l being optional.
. The alloying metal ions can be nickel, cobalt, silver or
any other suitable alloying metal. When certain alloying
ions are present, for example nickel and cobalt, a com
plexing agent is generally present to keep the ions in
solution and prevent their precipitation by oxalate. An
example of a complexing agent for nickel or cobalt is
pyrophosphate. The concentration of alloying ions,
added as for example a bath soluble salt, may range
from 1 to 60 g/] or the limit of solubility, with a range
of 5 to 30 g/l being preferred and a concentration of
about 10 g/l being optimal.
The concentration of complexing agent to be used
will depend on the concentration of alloying metal ions
and the stoichiometry of the complex of the alloying
metal and the complexing agent.
The concentration of oxalate or available oxalate in
the composition may broadly range from 0 01 M to 2 M
l or to the limit of solubility, with a range of from 0.1 IM
to 0.5 M being preferred and a concentration of about
0.25 M being optimal.
The source of oxalate ions may be an ammonium or
alkali metal salt such as sodium oxalate or potassium
oxalate or may be oxalic acid itself, and the source of
palladium may be palladium tetraamino dinitrate or
palladium diamino dinitrite or palladium diamine di
chloride or any other palladium salt yielding a tetram
mine palladium complex in the plating solution. Prefera
bly not more than 5, 10 or 15% of the palladium is
complexed to sulphite moities.
But it is particularly preferred to combine the source
of palladium and the source of oxalate ions as a single
entity. It has been found that if the palladium is added as
an oxalate complex or as a complex which yields oxa
late ions in the working aqueous composition (for exam—
ple by dissolution or hydrolysis), then a further advan
tage becomes apparent. This is thatno appreciable build
up of salt occurs in the solution apart from the establish
ment of equilibrium concentrations of ammonium car
bonate and ammonium bicarbonate, which are slowly
but steadily lost to the atmosphere as ammonia and
carbon dioxide. The reactions that occur are, in one
embodiment:
[Pdmmncpu —>Pd + mm + 2C0:
10
25
35
45
55
60
65
4
The nature of these reactions is such that the solution
is essentially self buffering, so that less pH buffering
salts are needed than might otherwise be required.
In this preferred aspect of the invention, the palla
dium may be added as palladium diamino oxalate
(Pd(NH3)2C2O4) palladium tetraamino oxalate
(Pd(NH3)4C2O4), or an ammonium or alkali metal salt
of palladium dioxalate (M2Pd(C2O4)2), where M repre
sents an ammonium or alkali metal cation. Of these, the
tetrammino oxalate salt is preferred because of its im
proved light-stability resulting from the fact that no
oxalate moities are complexed to the palladium atom.
The composition may also contain an electrolyte,
such as disodium hydrogen phosphate, present in an
effective amount up to the limit of solubility in the bath.
From 10 to 200 g/l electrolyte may be present, for ex
ample from 50 to 150 g/l, typically 100 g/l.
The composition may also contain stress reducers
and/or brighteners in effective amounts. Stress reducers
and brighteners which have been found to be effective
include those generally used in nickel plating systems.
Many acceptable stress reducers contain sulphur, for
example sulphonates such as sodium allyl sulphonate
and sodium orthobenzaldehyde sulphonate. Saccharin
is also an acceptable stress reducer. For brighteners, any
of the Class I or Class II nickel brighteners, which are
generally unsaturated, can be used. Brighteners which
are aldehydes or are alkenically or alkynically unsatu
rated are suitable.
The pH of the bath will typically range from 6 to 9,
with from 6.5 to 8 being the preferred range and 7 or 7.5
being optional.
According to a second aspect of the invention, there
is provided a method of plating palladium metal or
palladium alloy on a substrate, the method comprising
contacting the substrate with a compositipn comprising
a source of palladium, a source of oxalate ions and op
tionally a source of alloying metal ions and cathodically
electrifying the substrate.
Such a method can be used to deposit palladium in
thicknesses of0.1 to 10 microns, preferably between 0.2
and 5 microns, depending on the application, typically
between 0.5 and 2.5 for such applications as separable
connectors for the electronics industry.
Plating is preferably carried out at a temperature of
from 20° to 70° C., preferably from 30° to 70° C. with
about 50° C. being preferred.
The current density at which the method is carried
out can vary widely, for example from 0.1 to 200 ASD,
preferably from 1 to 100 ASD and typically, for low
speed operations, from 2 to 20 ASD. The plating rate
will clearly depend on the current density, but it has
been found that rates in the order of 1 micron per min
ute are obtainable at current densities at 4 or 5 ASD.
The nature of the anode used is not believed to be
particularly critical. Anodes such as those formed of (a)
a noble metal coated in a readily passivated substrate
(for example, platinised titanium), (b) pure noble metal,
for example pure platinum (these anodes are particu
larly suitable as nozzles in jet plating), (c) carbon or (d)
stainless steel may be found to be suitable. '
Other preferred features of the second aspect of the
invention are as for the ?rst aspect mutatis mutandis.
A third aspect of the invention involves replenishing
palladium or palladium alloy plating compositions with
a palladium oxalate complex or a palladium complex
which yields oxalate ions in the working aqueous com
position and according to a fourth aspect of the inven

4,715,935
5
tion there is provided a palladium-plated or palladium
alloy-plated substrate whenever plated by means of a
composition in accordance with the ?rst aspect of the
invention or by a method according to the second as
poet.
The following examples illustrate the invention.
EXAMPLE 1
An aqueous 500 ml plating composition was made up
with the following ingredients:
Pd as [Pd(NH3)2Cz04]
(NH4)2HP04 '
saccharin
sodium allyl sulphonate
sufficient ammonia
solution to adjust pH to
A platinised titanium anode was immersed in the
composition and a 0.5 dm2 nickel-plated brass test panel
was immersed as the cathode. Plating was carried out at
a temperature of 50° C. for 4 minutes. The current den
sity was 3 A/dmz. During plating, the composition was
agitated moderately by means ofa magnetic stirrer. A 4
micron thick fully bright deposit was obtained. No
apparently undesirable anode reactions took place dur
ing the plating process.
EXAMPLE 2
An aqueous 500 ml plating composition was made up
Pd as PD(NH3)4(N03)2 10 g/l
Ammonium oxalate 30 g/]
Sodium orthobenzaldehyde sulphonate 1 g/l
Butyne-l-4 diol 100 mg/l
Sufficient ammonia solution to 7.0
adjust the pH to
composition and a 0.5 drn2 nickel-plated brass test panel
was immersed as the cathode. Plating was carried out at
a temperature of 50° C. for 4 minutes. The current den
sity was 4 A/dmz. During plating, the composition was
agitated moderately by means ofa magnetic stirrer. A 3
micron thick fully bright deposit was obtained. No
apparently undesirable anode reactions took place dur
ing the plating process.
EXAMPLE 3
An aqueous 500 m1 plating composition was made up
Ni as NiSO4 71-120 5 g/l
tetrapotassium pyrophosphate 100 g/l
oxalic acid dihydrate 30 g/l
sodium orthobenzaldehyde 5 g/l
sulphonate
sufficient ammonia solution 8.0
to adjust pH to
composition and a 0.5 dm2 brass test panel, the reverse
side of which was masked off with suitable adhesive
tape, was immersed as the cathode. Plating was carried
out at a temperature of 60° C. for 20 minutes. The our
10
15
25
30
35
45
50
55
60
65
6
rent density was 4 A/dmz. During plating, the composi
tion was agitated moderately by means of a magnetic
stirrer. On removal of the adhesive tape and dissolution
of the brass in a solution of 100 ml/l H2804 and 100 ml
H20; (35%) in water, a 15 pm thick smooth semi bright
foil was obtained, which analysis revealed to contain
98% Pd and 2% Ni. No apparently undesirable anode
reactions took place during the plating process.
What is claimed is:
1. A method of electroplating palladium metal or
palladium alloy on a substrate which comprises contact
ing the substrate to be plated with an aqueous electro
plating composition comprising a source of palladium
metal, a source of oxalate ions and, optionally, a source
of alloying metal ions wherein, the source of the palla
dium metal and the source of oxalate ions are added
together to the composition in the form of a complex
selected from the group consisting of palladium oxalate
complexes and palladium complexes which yield oxa
late ions in the aqueous electroplating composition,
passing an electric current through the aqueous electro
plating composition between an anode and the substrate
to be plated as the cathode to cathodically electrify said
substrate and cause the electrodeposition of a palladium
containing layer thereon.
2. The method as claimed in claim 1, wherein palla
dium is plated to a thickness of from 0.1 to 10 microns.
3. The method as claimed in claim 1, wherein plating
is carried out at a current density of from 1 to 100 ASD.
4. The method as claimed in claim 1, wherein the
concentration of palladium in the composition ranges
from 5 g/l to 30 g/l.
5. The method as claimed in claim 1, wherein alloying
metal ions, selected from the group ofnickel, cobalt and
silver are present in the composition.
alloying metal ions are present at a concentration of
from 5 g/l to 30 g/l.
7. The method as claimed in claim 5, wherein a com
plexing agent for the alloying metal ions is present in the
composition.
concentration of available oxalate in the composition
ranges from 0.1 M to 5 M.
palladium oxalate complex in the composition is se
lected from the group consisting ofpalladium diammino
oxalate and palladium tetrammino oxalate.
palladium oxalate complex in the composition is se
lected from the group consisting of ammonium and
alkali metal salts of palladium dioxalate.
11. The method as claimed in claim 1 wherein the
composition also contains an electrolyte.
12. The method as claimed in claim 11 in which the
electrolyte is disodium hydrogen phosphate.
13. The method as claimed in claim 12 wherein the
electrolyte is present at a concentration of from 50 to
150 g/l.
composition further contains as a bath additive stress
reducer, brightener or mixtures thereof.
15. The method as claimed in claim 1 wherein the pH
ofjsaid composition is from 6.5 to 8.
i ‘I * * Ill

US4715935 (1)

More Related Content

What's hot (20)

Similar to US4715935 (1) (20)

US4715935 (1)